Sputtering Targets
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Hafnium Oxide Sputtering Target
HfO2, Purity: 99.99%, Dia: 50.8mm

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Hafnium Oxide Sputtering Target
Product | Hafnium Oxide Sputtering Target | |
Stock No | NS6130-10-1153 | |
Purity | 99.99% | Confirm |
Diameter | 50.8 mm ± 1mm | Confirm |
Thickness | 3 mm ± 0.5mm | Confirm |
Molecular Weight | 210.49 g/mol | Confirm |
Density | 9.68 g/cm³ | Confirm |
Melting Point | 2758 °C | Confirm |
Shape | Round | Confirm |
Backing Plate | Copper (as per customer requirement) | |
Size and Shape | Targets Diameter and thickness can be according to Customer Requirement | |
Conclusion | The specifications Confirm with enterprise standard | |
Quality Control | Each Lot of was tested successfully | |
Main Inspect Verifier | Manager QC |
Typical Chemical Analysis
Assay | 99.99% |
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Hafnium Oxide Sputtering Target
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